Contact Angle Measuring Equipment OCA 40 Micro
(Dataphysics, Filderstadt, Germany)
Fully automated measuring instrument for the analysis of the wetting behaviour of microscopic and macroscopic structure.
- Measuring lens with 55-fold zoom (optional 137.5-fold) and software controlled, motorized, focus and adjustment of the observation angle
- Software controlled dosing needle/ head positioning
- Temperature control / measurement
For further information please contact:
Alexander Münch
Ellipsometer SE 402
(Sentech Instruments GmbH, Berlin)
The ellipsometer delivers information about the surface modification (thickness) of substrates
- red He-Ne laser with a wavelength 632.8 nm is used
- incident angle of the laser measures at 70°
- After the sample surface is reached, the reflected light passes through the analyzer and drops onto a photo multiplier, which operates as a detector
- The control of the ellipsometer and the data evaluation requires special software
For further information please contact:
Alexander Münch
Null-Ellipsometer Multiscope
(Optrel, Berlin)
- Accuracy Δ±0.005°, Ψ±0.005°
- Information about layers growth (ex- or in-situ) and optical properties of the samples can be derived, using the ellipsometry method.
- Surface modification
- Swelling phenomena
- "in situ" monitoring of adsorption processes at interfaces
- Red He-Ne laser with a wavelenght 632.8 nm is used
Dual Rotating Compensator Ellipsometer RC2-D
(Woolam Co.)
- wavelength 193 bis 1000 nm
For further information please contact:
Petra Uhlmann
Fluorescence Microscope Axio Imager.A1m
(Carl Zeiss Jena GmbH)
- microscopy in reflection mode as well as standard light microscopy,
- Mercury short arc lamp for fluorescence microscopy; Halogen lamps for light microscopy
- SPOT Insight camera and single photon sensitive camera (CASCADE II 512) for low intensity fluorescence signals and monitoring of fast processes,
- LTS 350 heating / freezing stage,
- objectives: 5x, 10x Epiplan HD; 20x, 50x, 100x LD-EC Epiplan-Neofluar HD DIC
For further information please contact:
Alexander Münch
Fluorescence Microscope DMi8
(Leica Microsystems)
For further information please contact:
Julian Thiele
Cary 5000 UV-Vis-NIR
(Agilent Technologies Inc.)
- Light Source: Tungsten halogen visible and deuterium arc UV
- Maximum Scanning Speed: UV-Vis 2,000 nm/min NIR 8,000 nm/min
- Photometric System: Double beam
- Spectral Bandwidth: UV-Vis 0.01 - 5.00 nm, NIR 0.04 - 20 nm
- Wavelength 175 - 3300 nm
- Width 1020 mm Z-height 20 mm
FT-IR Spectrometer VERTEX 70
(Bruker Corporation)
For further information please contact:
Alexander Münch
Potentiostat/ Galvanostat PGSTAT 100
Metrohm Autolab
Current: Maximum output current: ± 250 mA, Range: 10 nA 100 mA, Accuracy: ±0.2 % of current + 0.2 % of current range)
Voltage: Maximum output voltage: ± 100 V, Range: ± 10 V, Accuracy: ± 0.2 % of setting/ ± 2 mV
Size: 520 mm (L) x 400 mm (W) x 166 mm (H)
PGSTAT100 is a modular high voltage potentiostat/galvanostat, especially suited for experimetns with low conductivity. Different electrochemical techniques can be used, e.g. standard cyclic voltammetry, AC voltammetry and constant current potentiostatic stripping analysis.
For further information please contact:
Olga Grätz
Climate chamber Type WK3-1000/70
Weiss Umwelttechnik GmbH/ Simulationsanlagen Messtechnik
- Accurate temperature and climate conditions to regulated air flow are ensured
- Special program/software for the analysis of the measuring data is available
- Tele-control via Intranet or Internet is possible
- Aditional setup for Ice-adhesion measurement (Measurement of the adhesion force of an ice droplet by using the radial force applied by a spin coater)
- Additional setup for Frost-formation measurement (Determination of frost layer thickness by focus point shifts)
For further information please contact:
René Winkler
Dip Coater
The Dip Coater is another option to dispose thin films on substrates.
For further information please contact:
René Winkler
Spin Coater Spin 150i
The Spin Coater is used to dispose thin films on different substrates (Si-Wafer, glass,...)
- Programmable
- max. 12.000 rpm
Sputter Coater SCD500
- Sputtering of Pt, Si, Cr, W
- Carbon Thread Evaporation
- Plasma Etching
- Cryo-Transfer System for Sputtering with Platinum
- Quarz for sputtered layer thickness monitoring
For further information please contact:
Michael Göbel
Sputter Coater SCD050
- Sputtering of gold layers
For further information please contact:
Andreas Janke
Plasma Chamber
Oxygen plasma for hydrophilisation of surfaces.
For further information please contact:
Michael Göbel
CeraFab 7500
(Lithoz)
- Package size: 7.6 cm x 4.3 cm x 15 cm
- Layer thickness: 25 - 100 μm
- Print speed: up to 100 layers per hour
- Print resolution: 40 μm (635 dpi)
For further information please contact:
Julian Thiele